The CIM-200 (DIC) / Model 10134 is our premier inverted metallurgical research station, integrating high-end Differential Interference Contrast (DIC) technology for the three-dimensional visualization of metal surfaces. As a specialized CIM-200 (DIC) Manufacturer in India, we have engineered this system to reveal minute topographical details, scratches, and grain boundaries that remain invisible under standard brightfield or darkfield illumination. The inverted configuration is specifically designed to accommodate massive, oversized, and heavy industrial specimens with minimal sample preparation.

Leading as a global CIM-200 (DIC) 10134 Exporter, we provide this workstation with high-aperture infinity-corrected plan achromatic DIC objectives and a precision Nomarski prism assembly. The CIM-200 series excels in Advanced Material Science, allowing for the observation of transparent and semi-transparent layers on opaque substrates. It features a high-intensity 100W Kohler illumination system, ensuring the optical power required for complex phase analysis in Nanotechnology and Semiconductor Engineering.

The CIM-200 (DIC) is the standard for Wafer Defect Metrology, Super-Alloy Microstructure Analysis, and Thin Film Characterization. It is an indispensable tool for Research Institutes and Aerospace Defense Labs where the topographical accuracy of metal surfaces is critical for component safety and performance reporting.